Patterning single-layer materials by electrical breakdown using atomic force microscopy
In: Nanotechnology and Precision Engineering, Jg. 7 (2024), Heft 1, S. 013008-013008-7
Online
academicJournal
Zugriff:
The development of nanoelectronics and nanotechnologies has been boosted significantly by the emergence of 2D materials because of their atomic thickness and peculiar properties, and developing a universal, precise patterning technology for single-layer 2D materials is critical for assembling nanodevices. Demonstrated here is a nanomachining technique using electrical breakdown by an AFM tip to fabricate nanopores, nanostrips, and other nanostructures on demand. This can be achieved by voltage scanning or applying a constant voltage while moving the tip. By measuring the electrical current, the formation process on single-layer materials was shown quantitatively. The present results provide evidence of successful pattern fabrication on single-layer MoS2, boron nitride, and graphene, although further confirmation is still needed. The proposed method holds promise as a general nanomachining technology for the future.
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Patterning single-layer materials by electrical breakdown using atomic force microscopy
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Autor/in / Beteiligte Person: | Yang, Yajie ; Lu, Jiajia ; Xie, Yanbo ; Duan, Libing |
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Zeitschrift: | Nanotechnology and Precision Engineering, Jg. 7 (2024), Heft 1, S. 013008-013008-7 |
Veröffentlichung: | AIP Publishing LLC, 2024 |
Medientyp: | academicJournal |
ISSN: | 2589-5540 (print) |
DOI: | 10.1063/10.0023848 |
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